• Resolution: 3.0 nm in high resolution, high vacuum mode
  • Accelerating voltages; 0.3-30 kV
  • Magnification: 5-300,000 X
  • Tungsten Filament
  • Secondary electron detectors
  • Backscattered electron detector
  • Multisample holder
  • 3-D imaging

  • Resolution: 0.204 nm lattice, 0.36 nm point-to-point
  • LaB6 Filament
  • Accelerating voltages: 20, 40, 60, 80, 100 kV
  • Magnification: 200-600,000 X
  • Goniometer stage: +/- 60 degree tilt
  • Digital and film cameras

  • Ti2-E Fully Motorized Inverted Microscope
  • C2 Laser Scanning Confocal
  • LUN4 4 Line Solid State Laser System (405, 488, 561 and 640 nm)
  • DUVb GaAsP Based Spectral Detector
  • LED Based Epi Fluorescent System (DAPI, FITC, TRITC cubes)
  • Perfect Focus System 4
  • Nikon Plan Apo Lambda 10x NA 0.45
  • Nikon Plan Apo Lambda 20x NA 0.75
  • Nikon Plan Fluor 40x NA 1.30 oil immersion
  • Nikon Plan Apo Lambda 60x NA 1.40 oil immersion 0.13mm WD
  • Nikon Plan Fluor 20x NA 0.75 Multi immersion (Water, Glycerin, Oil) 0.35mm WD
  • DIC optics
  • 2048 x 2048 pixel resolution 

  • Eclipse TE2000-u Inverted Microscope
  • Zyla Camera
  • Brightfield optics
  • DIC, FITC, TRIC, YFP and mCherry Shortpass Filter Cubes
  • NIS Elements Digital imaging software
  • Nikon Plan 4x NA 0.1
  • Nikon Achromat 10x Ph 1 DL NA 0.3
  • Nikon Plan Fluor 40x DIC M N2 NA 0.8
  • Nikon Apo λS 60x NA 1.40 oil immersion (working distance 0.14mm)
  • Nikon Plan Fluor 100X Oil DIC H N2 NA 1.3
  • Nikon Plan Apo λ 100X Oil

  • Leica RM2135 Microtome
  • HIstology embedding and staining equipment, 
  • Leica Ultracut UC6 ultramicrotome*
  • Anatech Hummer 6.6 sputtering system
  • Denton DV-502 vacuum evaporator
  • Denton DCP-1 critical point dryer
  • Negative and print darkrooms

*The Hitachi H-7650 transmission electron microscope and Leica Ultracut UC6 ultramicrotome were purchased through NSF MUE grant 0500766.